Programmable proximity aperture lithography with MeV ion beams

• المؤلفون الرئيسيون: Puttaraksa N., Gorelick S., Sajavaara T., Laitinen M., Singkarat S., Whitlow H.J.
• التنسيق: مقال
• اللغة: English
• منشور في: 2014
• الوصول للمادة أونلاين: http://www.scopus.com/inward/record.url?eid=2-s2.0-53349156593&partnerID=40&md5=a8a4aaf80fd86905698a14e95e1f6890; http://cmuir.cmu.ac.th/handle/6653943832/5464
• المؤسسة: Chiang Mai University

A novel MeV ion beam programmable proximity aperture lithography system has been constructed at the Accelerator Laboratory of the University of Jyväskylä, Finland. This facility can be used to fabricate three dimensional microstructures in thick (<100 μm) polymer resist such as polymethylmethacry...