Fabrication of microfluidic devices using MeV ion beam Programmable Proximity Aperture Lithography (PPAL)
MeV ion beam lithography is a direct writing technique capable of producing microfluidic patterns and lab-on-chip devices with straight walls in thick resist films. In this technique a small beam spot of MeV ions is scanned over the resist surface to generate a latent image of the pattern. The micro...
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| Main Authors: | , , , , , |
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| 格式: | 雜誌 |
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2018
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| 在線閱讀: | https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=44449134554&origin=inward http://cmuir.cmu.ac.th/jspui/handle/6653943832/60738 |
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| 機構: | Chiang Mai University |