Fabrication of microfluidic devices using MeV ion beam Programmable Proximity Aperture Lithography (PPAL)

MeV ion beam lithography is a direct writing technique capable of producing microfluidic patterns and lab-on-chip devices with straight walls in thick resist films. In this technique a small beam spot of MeV ions is scanned over the resist surface to generate a latent image of the pattern. The micro...

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Bibliographic Details
Main Authors: S. Gorelick, N. Puttaraksa, T. Sajavaara, M. Laitinen, S. Singkarat, H. J. Whitlow
Format: Journal
Published: 2018
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Online Access:https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=44449134554&origin=inward
http://cmuir.cmu.ac.th/jspui/handle/6653943832/60738
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Institution: Chiang Mai University

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