Chemical analysis of etching residues in metal gate stack for CMOS process

by Wan, S.H., Hui, H.N., Won, J.Y., Bliznetsov, V.
Published 2014

Chemically assisted formation of nanocrystals for micro-electronics application

by Tan, Z., Gupta, R., Samanta, S.K., Lee, S., Won, J.Y.
Published 2014

Novel ZrO2/Si3N4 dual charge storage layer to form step-up potential wells for highly reliable multi-level cell application

by Zhang, G., Wan, S.H., Bobade, S.M., Lee, S.-H., Cho, B.-J., Won, J.Y.
Published 2014