#TITLE_ALTERNATIVE#
Carbon Thin Film was sucessfully deposited on top of silicon (111) substrate with and without HF treatment to the silicon substrate. Carbon thin film was deposited using Unbalance Magetron DC Sputtering. Silicon surface which been modified using HF 1% solution create more uniform thin films. AFM, SE...
Saved in:
| Main Author: | |
|---|---|
| Format: | Final Project |
| Language: | Indonesia |
| Online Access: | https://digilib.itb.ac.id/gdl/view/18214 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| Institution: | Institut Teknologi Bandung |
| Language: | Indonesia |