PENGEMBANGAN SISTEM HOT WIRE UNTUK PENUMBUHAN LAPISAN TIPIS SILIKON POLIKRISTAL DENGAN KONDUKTIVITAS TINGGI
<b>Abstract: </b><br> It has been grown polycrystalline silicon thin film on silicon wafer <111>, using Hot Wire Plasma Enhanced Chemical Vapor Deposition (HW-PECVD). Silane gas (SiH<sub>4</sub>), 10% diluted in H<sub>2</sub> was used as a gas source....
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| 格式: | Theses |
| 語言: | Indonesia |
| 在線閱讀: | https://digilib.itb.ac.id/gdl/view/3044 |
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| 機構: | Institut Teknologi Bandung |
| 語言: | Indonesia |