KONSTRUKSI ALAT METAL ORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD) DAN ANALIS STRUKTUR LAPISAN TIPIS ZNO YANG DITUMBUHKANNYA

<b>Abstract :</b><p align=\"justify\"> <br /> <br /> <br /> A new design of Metalorganic Chemical Vapor Deposition (MOCVD) equipment was constructed. The analysis of its construction showed that out put variables, i.e; deposition rate and atom compo...

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التفاصيل البيبلوغرافية
المؤلف الرئيسي: FransSangian, Hanny
التنسيق: Theses
اللغة:Indonesia
الموضوعات:
الوصول للمادة أونلاين:https://digilib.itb.ac.id/gdl/view/4679
الوسوم: إضافة وسم
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المؤسسة: Institut Teknologi Bandung
اللغة: Indonesia
id id-itb.:4679
spelling id-itb.:46792006-06-08T16:48:07ZKONSTRUKSI ALAT METAL ORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD) DAN ANALIS STRUKTUR LAPISAN TIPIS ZNO YANG DITUMBUHKANNYA FransSangian, Hanny Fisika Indonesia Theses INSTITUT TEKNOLOGI BANDUNG https://digilib.itb.ac.id/gdl/view/4679 <b>Abstract :</b><p align=\"justify\"> <br /> <br /> <br /> A new design of Metalorganic Chemical Vapor Deposition (MOCVD) equipment was constructed. The analysis of its construction showed that out put variables, i.e; deposition rate and atom composition of ZnO thin film, depend on five control variables, i.e; water-carrier gas flow rate, metalorganic-carrier gas flow rate, system pressure, water bubbler temperature, and metalorganic bubbler temperature, which the change of bubbler temperature gives the biggest error. Undoped ZnO thin films were grown on substrate of Corning glass 7059 by using (DMZ,H20) and (DEZ,H20) reactant systems. It was found that the highest deposition rate was 10 Rm./h. It is five times higher than the published data. It was also found a crystal orientation transition temperature in which the orientation changes from (002) to (110) at a different temperature for each reactant systems. The transition was occured at 100 °C and 120 °C for (DMZ,H20) and (DEZ,H20) reactant system, respectively.<p align=\"justify\"> <br /> <br /> text
institution Institut Teknologi Bandung
building Institut Teknologi Bandung Library
continent Asia
country Indonesia
Indonesia
content_provider Institut Teknologi Bandung
collection Digital ITB
language Indonesia
topic Fisika
spellingShingle Fisika
FransSangian, Hanny
KONSTRUKSI ALAT METAL ORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD) DAN ANALIS STRUKTUR LAPISAN TIPIS ZNO YANG DITUMBUHKANNYA
description <b>Abstract :</b><p align=\"justify\"> <br /> <br /> <br /> A new design of Metalorganic Chemical Vapor Deposition (MOCVD) equipment was constructed. The analysis of its construction showed that out put variables, i.e; deposition rate and atom composition of ZnO thin film, depend on five control variables, i.e; water-carrier gas flow rate, metalorganic-carrier gas flow rate, system pressure, water bubbler temperature, and metalorganic bubbler temperature, which the change of bubbler temperature gives the biggest error. Undoped ZnO thin films were grown on substrate of Corning glass 7059 by using (DMZ,H20) and (DEZ,H20) reactant systems. It was found that the highest deposition rate was 10 Rm./h. It is five times higher than the published data. It was also found a crystal orientation transition temperature in which the orientation changes from (002) to (110) at a different temperature for each reactant systems. The transition was occured at 100 °C and 120 °C for (DMZ,H20) and (DEZ,H20) reactant system, respectively.<p align=\"justify\"> <br /> <br />
format Theses
author FransSangian, Hanny
author_facet FransSangian, Hanny
author_sort FransSangian, Hanny
title KONSTRUKSI ALAT METAL ORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD) DAN ANALIS STRUKTUR LAPISAN TIPIS ZNO YANG DITUMBUHKANNYA
title_short KONSTRUKSI ALAT METAL ORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD) DAN ANALIS STRUKTUR LAPISAN TIPIS ZNO YANG DITUMBUHKANNYA
title_full KONSTRUKSI ALAT METAL ORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD) DAN ANALIS STRUKTUR LAPISAN TIPIS ZNO YANG DITUMBUHKANNYA
title_fullStr KONSTRUKSI ALAT METAL ORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD) DAN ANALIS STRUKTUR LAPISAN TIPIS ZNO YANG DITUMBUHKANNYA
title_full_unstemmed KONSTRUKSI ALAT METAL ORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD) DAN ANALIS STRUKTUR LAPISAN TIPIS ZNO YANG DITUMBUHKANNYA
title_sort konstruksi alat metal organic chemical vapor deposition (mocvd) dan analis struktur lapisan tipis zno yang ditumbuhkannya
url https://digilib.itb.ac.id/gdl/view/4679
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