Heat-assisted μ-electrical discharge machining of silicon

Micro-electrical discharge machining (μEDM) is an unconventional machining method that is suitable for machining of conductive materials including highly doped silicon (Si) wafers. This paper reports a novel method of heat-assisted μEDM machining of Si wafers by varying the temperature to increase...

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Bibliographic Details
Main Authors: Daud, Noor Dzulaikha, Ghazali, Farah Afiqa Mohd, Hamid, Fatimah Khairiah Abd, Nafea, Marwan, Saleh, Tanveer, Leow, Pei Ling, Ali, Mohamed Sultan Mohamed
Format: Article
Language:English
Published: Springer Nature 2021
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Online Access:http://irep.iium.edu.my/88380/1/88380_Heat-assisted%20%CE%BC-electrical.pdf
http://irep.iium.edu.my/88380/
https://link.springer.com/article/10.1007/s00170-021-06734-y
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Institution: Universiti Islam Antarabangsa Malaysia
Language: English
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Summary:Micro-electrical discharge machining (μEDM) is an unconventional machining method that is suitable for machining of conductive materials including highly doped silicon (Si) wafers. This paper reports a novel method of heat-assisted μEDM machining of Si wafers by varying the temperature to increase the electrical conductivity of Si. In order to achieve this condition, a ceramic heater is used to heat the Si wafers within the temperature range of 30–250 °C. In this study, themachining performances in terms of the material removal rate, tool wear rate, surface quality, and materials characterization have been investigated accordingly. The machining performance of p-type (1–10 Ω cm) Si wafers was investigated to machine a cavity based on different temperatures with a constant discharge energy of 50 μJ and a feed rate of 50 μm/min. The results indicated that increasing the machining temperature allowed achieving a higher material removal rate, lower tool wear rate, and lower surface roughness. The highest material removal rate of 1.43 × 10−5 mm3/s and a surface roughness of 1.487 μm were achieved at 250 °C. In addition, the material removal rate increased by a factor of ~16 times compared to the results obtained at the lowest temperature, 30 °C, and the Raman spectroscopy analysis revealed that no significant changes occurred in the Si structure before and after machining.