Heat-assisted μ-electrical discharge machining of silicon

Micro-electrical discharge machining (μEDM) is an unconventional machining method that is suitable for machining of conductive materials including highly doped silicon (Si) wafers. This paper reports a novel method of heat-assisted μEDM machining of Si wafers by varying the temperature to increase...

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Main Authors: Daud, Noor Dzulaikha, Ghazali, Farah Afiqa Mohd, Hamid, Fatimah Khairiah Abd, Nafea, Marwan, Saleh, Tanveer, Leow, Pei Ling, Ali, Mohamed Sultan Mohamed
Format: Article
Language:English
Published: Springer Nature 2021
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Online Access:http://irep.iium.edu.my/88380/1/88380_Heat-assisted%20%CE%BC-electrical.pdf
http://irep.iium.edu.my/88380/
https://link.springer.com/article/10.1007/s00170-021-06734-y
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Institution: Universiti Islam Antarabangsa Malaysia
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spelling my.iium.irep.883802021-02-24T03:57:44Z http://irep.iium.edu.my/88380/ Heat-assisted μ-electrical discharge machining of silicon Daud, Noor Dzulaikha Ghazali, Farah Afiqa Mohd Hamid, Fatimah Khairiah Abd Nafea, Marwan Saleh, Tanveer Leow, Pei Ling Ali, Mohamed Sultan Mohamed T Technology (General) Micro-electrical discharge machining (μEDM) is an unconventional machining method that is suitable for machining of conductive materials including highly doped silicon (Si) wafers. This paper reports a novel method of heat-assisted μEDM machining of Si wafers by varying the temperature to increase the electrical conductivity of Si. In order to achieve this condition, a ceramic heater is used to heat the Si wafers within the temperature range of 30–250 °C. In this study, themachining performances in terms of the material removal rate, tool wear rate, surface quality, and materials characterization have been investigated accordingly. The machining performance of p-type (1–10 Ω cm) Si wafers was investigated to machine a cavity based on different temperatures with a constant discharge energy of 50 μJ and a feed rate of 50 μm/min. The results indicated that increasing the machining temperature allowed achieving a higher material removal rate, lower tool wear rate, and lower surface roughness. The highest material removal rate of 1.43 × 10−5 mm3/s and a surface roughness of 1.487 μm were achieved at 250 °C. In addition, the material removal rate increased by a factor of ~16 times compared to the results obtained at the lowest temperature, 30 °C, and the Raman spectroscopy analysis revealed that no significant changes occurred in the Si structure before and after machining. Springer Nature 2021-02-01 Article PeerReviewed application/pdf en http://irep.iium.edu.my/88380/1/88380_Heat-assisted%20%CE%BC-electrical.pdf Daud, Noor Dzulaikha and Ghazali, Farah Afiqa Mohd and Hamid, Fatimah Khairiah Abd and Nafea, Marwan and Saleh, Tanveer and Leow, Pei Ling and Ali, Mohamed Sultan Mohamed (2021) Heat-assisted μ-electrical discharge machining of silicon. International Journal of Advanced manufacturing Technology. pp. 1-12. ISSN 0268-3768 E-ISSN 1433-3015 (In Press) https://link.springer.com/article/10.1007/s00170-021-06734-y 10.1007/s00170-021-06734-y
institution Universiti Islam Antarabangsa Malaysia
building IIUM Library
collection Institutional Repository
continent Asia
country Malaysia
content_provider International Islamic University Malaysia
content_source IIUM Repository (IREP)
url_provider http://irep.iium.edu.my/
language English
topic T Technology (General)
spellingShingle T Technology (General)
Daud, Noor Dzulaikha
Ghazali, Farah Afiqa Mohd
Hamid, Fatimah Khairiah Abd
Nafea, Marwan
Saleh, Tanveer
Leow, Pei Ling
Ali, Mohamed Sultan Mohamed
Heat-assisted μ-electrical discharge machining of silicon
description Micro-electrical discharge machining (μEDM) is an unconventional machining method that is suitable for machining of conductive materials including highly doped silicon (Si) wafers. This paper reports a novel method of heat-assisted μEDM machining of Si wafers by varying the temperature to increase the electrical conductivity of Si. In order to achieve this condition, a ceramic heater is used to heat the Si wafers within the temperature range of 30–250 °C. In this study, themachining performances in terms of the material removal rate, tool wear rate, surface quality, and materials characterization have been investigated accordingly. The machining performance of p-type (1–10 Ω cm) Si wafers was investigated to machine a cavity based on different temperatures with a constant discharge energy of 50 μJ and a feed rate of 50 μm/min. The results indicated that increasing the machining temperature allowed achieving a higher material removal rate, lower tool wear rate, and lower surface roughness. The highest material removal rate of 1.43 × 10−5 mm3/s and a surface roughness of 1.487 μm were achieved at 250 °C. In addition, the material removal rate increased by a factor of ~16 times compared to the results obtained at the lowest temperature, 30 °C, and the Raman spectroscopy analysis revealed that no significant changes occurred in the Si structure before and after machining.
format Article
author Daud, Noor Dzulaikha
Ghazali, Farah Afiqa Mohd
Hamid, Fatimah Khairiah Abd
Nafea, Marwan
Saleh, Tanveer
Leow, Pei Ling
Ali, Mohamed Sultan Mohamed
author_facet Daud, Noor Dzulaikha
Ghazali, Farah Afiqa Mohd
Hamid, Fatimah Khairiah Abd
Nafea, Marwan
Saleh, Tanveer
Leow, Pei Ling
Ali, Mohamed Sultan Mohamed
author_sort Daud, Noor Dzulaikha
title Heat-assisted μ-electrical discharge machining of silicon
title_short Heat-assisted μ-electrical discharge machining of silicon
title_full Heat-assisted μ-electrical discharge machining of silicon
title_fullStr Heat-assisted μ-electrical discharge machining of silicon
title_full_unstemmed Heat-assisted μ-electrical discharge machining of silicon
title_sort heat-assisted μ-electrical discharge machining of silicon
publisher Springer Nature
publishDate 2021
url http://irep.iium.edu.my/88380/1/88380_Heat-assisted%20%CE%BC-electrical.pdf
http://irep.iium.edu.my/88380/
https://link.springer.com/article/10.1007/s00170-021-06734-y
_version_ 1692991603898056704