Silica microchannel fabrication using fluorine based rie with alas a mask
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2013
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my.unimap-266282013-07-13T04:03:16Z Silica microchannel fabrication using fluorine based rie with alas a mask Wan Mokhzani, Wan Norhaimi Retnasamy, Vithyacharan Zaliman, Sauli, Assoc. Prof. Dr. Taniselass, Steven Ahmad Husni, Mohd Shapri Norazeani, Abdul Rahman Abdul Halis, Abdul Aziz wanmokhdzani@unimap.edu.my Reactive Ion Etching Process (RIE) Silica microchannel Fabrication process Microfluidics Link to publisher's homepage at www.aensiweb.com/ The silica microchannel fabrication process has been executed with Al thin films as the sacrificial layer during Reactive Ion Etching Process (RIE). CF4/Ar and SF6/Ar plasmas has been used to investigate etch rate of Al thin films and silica wafer. Energy Dispersive X-ray (EDX) analysis has been used to investigate the chemical residues on the surface of silica wafer after RIE process. The transparency of the silica waveguide has also been inspected based on fringe visibility with the aid of the Twyman-Green Interferometer (TGI) for interferometry measurements. The results demonstrate that CF4/Ar plasma etches silica faster than SF6/Ar plasma while keeping the etching rate of Al minimal. Residues are also less visible on the surface of the microchannel when applying CF4/Ar plasma. 2013-07-13T04:03:16Z 2013-07-13T04:03:16Z 2012-09 Article Australian Journal of Basic and Applied Sciences, vol. 6(9), 2012, pages 732-737 1991-8178 http://www.ajbasweb.com/ajbas/2012/Sep%202012/732-737.pdf http://hdl.handle.net/123456789/26628 en INSInet Publications |
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Universiti Malaysia Perlis |
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| language |
English |
| topic |
Reactive Ion Etching Process (RIE) Silica microchannel Fabrication process Microfluidics |
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Reactive Ion Etching Process (RIE) Silica microchannel Fabrication process Microfluidics Wan Mokhzani, Wan Norhaimi Retnasamy, Vithyacharan Zaliman, Sauli, Assoc. Prof. Dr. Taniselass, Steven Ahmad Husni, Mohd Shapri Norazeani, Abdul Rahman Abdul Halis, Abdul Aziz Silica microchannel fabrication using fluorine based rie with alas a mask |
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Link to publisher's homepage at www.aensiweb.com/ |
| author2 |
wanmokhdzani@unimap.edu.my |
| author_facet |
wanmokhdzani@unimap.edu.my Wan Mokhzani, Wan Norhaimi Retnasamy, Vithyacharan Zaliman, Sauli, Assoc. Prof. Dr. Taniselass, Steven Ahmad Husni, Mohd Shapri Norazeani, Abdul Rahman Abdul Halis, Abdul Aziz |
| format |
Article |
| author |
Wan Mokhzani, Wan Norhaimi Retnasamy, Vithyacharan Zaliman, Sauli, Assoc. Prof. Dr. Taniselass, Steven Ahmad Husni, Mohd Shapri Norazeani, Abdul Rahman Abdul Halis, Abdul Aziz |
| author_sort |
Wan Mokhzani, Wan Norhaimi |
| title |
Silica microchannel fabrication using fluorine based rie with alas a mask |
| title_short |
Silica microchannel fabrication using fluorine based rie with alas a mask |
| title_full |
Silica microchannel fabrication using fluorine based rie with alas a mask |
| title_fullStr |
Silica microchannel fabrication using fluorine based rie with alas a mask |
| title_full_unstemmed |
Silica microchannel fabrication using fluorine based rie with alas a mask |
| title_sort |
silica microchannel fabrication using fluorine based rie with alas a mask |
| publisher |
INSInet Publications |
| publishDate |
2013 |
| url |
http://dspace.unimap.edu.my/xmlui/handle/123456789/26628 |
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1643795006209654784 |