Effects of Texturing Silicon Wafer Surfaces Using Metal-Assisted Chemical Etching (MACE) Technique

Aspect ratio; Electrochemical etching; Gallium alloys; Gallium arsenide; Gallium nitride; Gold deposits; Hydrofluoric acid; III-V semiconductors; Indium phosphide; Nanowires; Porosity; Porous silicon; Scanning electron microscopy; Semiconducting indium gallium arsenide; Semiconducting indium phosphi...

Full description

Saved in:
Bibliographic Details
Main Authors: Razak N.H.A., Amin N., Kiong T.S., Sopian K., Akhtaruzzaman M.
Other Authors: 54397656800
Format: Conference Paper
Published: Institute of Electrical and Electronics Engineers Inc. 2023
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: Universiti Tenaga Nasional
Be the first to leave a comment!
You must be logged in first