Optimization of 14NM double gate Bi-GFET for lower leakage current

In recent years, breakthroughs in electronics technology have upgraded the physical properties of the metal oxide semiconductor field effect transistor (MOSFET) toward smaller sizes and improvements in both quality and performance. Hence, the growth field effect transistor (GFET) is being promoted...

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Main Authors: Abdul Hamid, Afifah Maheran, Mohd Nizam, Nur Hazwani Naili, Salehuddin, Fauziyah, Mohd Zain, Anis Suhaila, Zainul Abidin, Noor Faizah, Kaharudin, Khairil Ezwan
Format: Article
Language:English
Published: Universitas Ahmad Dahlan 2023
Online Access:http://eprints.utem.edu.my/id/eprint/27132/2/FULL%20PAPER.PDF
http://eprints.utem.edu.my/id/eprint/27132/
http://telkomnika.uad.ac.id/index.php/TELKOMNIKA/article/view/23462
http://doi.org/10.12928/telkomnika.v21i1.23462
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Institution: Universiti Teknikal Malaysia Melaka
Language: English
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spelling my.utem.eprints.271322024-06-24T08:26:53Z http://eprints.utem.edu.my/id/eprint/27132/ Optimization of 14NM double gate Bi-GFET for lower leakage current Abdul Hamid, Afifah Maheran Mohd Nizam, Nur Hazwani Naili Salehuddin, Fauziyah Mohd Zain, Anis Suhaila Zainul Abidin, Noor Faizah Kaharudin, Khairil Ezwan In recent years, breakthroughs in electronics technology have upgraded the physical properties of the metal oxide semiconductor field effect transistor (MOSFET) toward smaller sizes and improvements in both quality and performance. Hence, the growth field effect transistor (GFET) is being promoted as one of the worthy candidates due to its superior material characteristics. A 14 nm horizontal double-gate bilayer graphene field effect transistor (FET) utilizing high-k and a metal gate, which are composed of hafnium dioxide (HfO2) and tungsten silicide (WSix) respectively. Silvaco ATHENA and ATLAS technology computer-aided design (TCAD) tools are used to simulate the design and electrical properties, while Taguchi L9 orthogonal arrays (OA) are used to optimize the electrical properties. The threshold voltage (VTH) adjustment implant dose, VTH adjustment implant energy, source/drain (S/D) implant dose, and S/D implant energy have all been investigated as process parameters, while the VTH adjustment tilt angle and the S/D implant tilt angle have been investigated as noise factors. When compared to the initial findings before optimization, the IOFF has a value of 29.579 nA/µm, indicating a significant improvement. Findings from the optimization technique demonstrate excellent device performance with an IOFF of 28.564 nA/µm, which is closer to the international technology roadmap for semiconductors (ITRS) 2013 target. Universitas Ahmad Dahlan 2023-02 Article PeerReviewed text en http://eprints.utem.edu.my/id/eprint/27132/2/FULL%20PAPER.PDF Abdul Hamid, Afifah Maheran and Mohd Nizam, Nur Hazwani Naili and Salehuddin, Fauziyah and Mohd Zain, Anis Suhaila and Zainul Abidin, Noor Faizah and Kaharudin, Khairil Ezwan (2023) Optimization of 14NM double gate Bi-GFET for lower leakage current. TELKOMNIKA Telecommunication Computing Electronics and Control, 21 (1). pp. 195-202. ISSN 1693-6930 http://telkomnika.uad.ac.id/index.php/TELKOMNIKA/article/view/23462 http://doi.org/10.12928/telkomnika.v21i1.23462
institution Universiti Teknikal Malaysia Melaka
building UTEM Library
collection Institutional Repository
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country Malaysia
content_provider Universiti Teknikal Malaysia Melaka
content_source UTEM Institutional Repository
url_provider http://eprints.utem.edu.my/
language English
description In recent years, breakthroughs in electronics technology have upgraded the physical properties of the metal oxide semiconductor field effect transistor (MOSFET) toward smaller sizes and improvements in both quality and performance. Hence, the growth field effect transistor (GFET) is being promoted as one of the worthy candidates due to its superior material characteristics. A 14 nm horizontal double-gate bilayer graphene field effect transistor (FET) utilizing high-k and a metal gate, which are composed of hafnium dioxide (HfO2) and tungsten silicide (WSix) respectively. Silvaco ATHENA and ATLAS technology computer-aided design (TCAD) tools are used to simulate the design and electrical properties, while Taguchi L9 orthogonal arrays (OA) are used to optimize the electrical properties. The threshold voltage (VTH) adjustment implant dose, VTH adjustment implant energy, source/drain (S/D) implant dose, and S/D implant energy have all been investigated as process parameters, while the VTH adjustment tilt angle and the S/D implant tilt angle have been investigated as noise factors. When compared to the initial findings before optimization, the IOFF has a value of 29.579 nA/µm, indicating a significant improvement. Findings from the optimization technique demonstrate excellent device performance with an IOFF of 28.564 nA/µm, which is closer to the international technology roadmap for semiconductors (ITRS) 2013 target.
format Article
author Abdul Hamid, Afifah Maheran
Mohd Nizam, Nur Hazwani Naili
Salehuddin, Fauziyah
Mohd Zain, Anis Suhaila
Zainul Abidin, Noor Faizah
Kaharudin, Khairil Ezwan
spellingShingle Abdul Hamid, Afifah Maheran
Mohd Nizam, Nur Hazwani Naili
Salehuddin, Fauziyah
Mohd Zain, Anis Suhaila
Zainul Abidin, Noor Faizah
Kaharudin, Khairil Ezwan
Optimization of 14NM double gate Bi-GFET for lower leakage current
author_facet Abdul Hamid, Afifah Maheran
Mohd Nizam, Nur Hazwani Naili
Salehuddin, Fauziyah
Mohd Zain, Anis Suhaila
Zainul Abidin, Noor Faizah
Kaharudin, Khairil Ezwan
author_sort Abdul Hamid, Afifah Maheran
title Optimization of 14NM double gate Bi-GFET for lower leakage current
title_short Optimization of 14NM double gate Bi-GFET for lower leakage current
title_full Optimization of 14NM double gate Bi-GFET for lower leakage current
title_fullStr Optimization of 14NM double gate Bi-GFET for lower leakage current
title_full_unstemmed Optimization of 14NM double gate Bi-GFET for lower leakage current
title_sort optimization of 14nm double gate bi-gfet for lower leakage current
publisher Universitas Ahmad Dahlan
publishDate 2023
url http://eprints.utem.edu.my/id/eprint/27132/2/FULL%20PAPER.PDF
http://eprints.utem.edu.my/id/eprint/27132/
http://telkomnika.uad.ac.id/index.php/TELKOMNIKA/article/view/23462
http://doi.org/10.12928/telkomnika.v21i1.23462
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