A Chemically Amplified Fullerene-Derivative Molecular Electron-Beam Resist

• Main Authors: Gibbons, Francis, Mohd Zaid, Hasnah, Robinson, A.P.G.
• Format: Article
• Published: 2007
• Subjects: QC Physics
• Online Access: http://eprints.utp.edu.my/886/1/Small_2007.PDF; http://eprints.utp.edu.my/886/
• Institution: Universiti Teknologi Petronas

Current lithographic resists depend on large polymeric materials, which are starting to limit further improvements in line-width roughness and feature size. Fullerene molecular resists use much smaller molecules to avoid this problem. However, such resists have poor radiation sensitivity. Chemical a...