Process stabilization by peak current regulation in reactive high-power impulse magnetron sputtering of hafnium nitride
A simple and cost effective approach to stabilize the sputtering process in the transition zone during reactive high-power impulse magnetron sputtering (HiPIMS) is proposed. The method is based on real-time monitoring and control of the discharge current waveforms. To stabilize the process condition...
محفوظ في:
| المؤلفون الرئيسيون: | , , , |
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| التنسيق: | text |
| منشور في: |
Animo Repository
2016
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| الموضوعات: | |
| الوصول للمادة أونلاين: | https://animorepository.dlsu.edu.ph/faculty_research/11594 |
| الوسوم: |
إضافة وسم
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| المؤسسة: | De La Salle University |