Process stabilization by peak current regulation in reactive high-power impulse magnetron sputtering of hafnium nitride

A simple and cost effective approach to stabilize the sputtering process in the transition zone during reactive high-power impulse magnetron sputtering (HiPIMS) is proposed. The method is based on real-time monitoring and control of the discharge current waveforms. To stabilize the process condition...

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Bibliographic Details
Main Authors: Shimizu, Tetsuhide, Villamayor, Michelle Marie S., Lundin, Daniel, Helmersson, Ulf
Format: text
Published: Animo Repository 2016
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Online Access:https://animorepository.dlsu.edu.ph/faculty_research/11594
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Institution: De La Salle University