Process stabilization by peak current regulation in reactive high-power impulse magnetron sputtering of hafnium nitride

• Main Authors: Shimizu, Tetsuhide, Villamayor, Michelle Marie S., Lundin, Daniel, Helmersson, Ulf
• Format: text
• Published: Animo Repository 2016
• Subjects: Sputtering (Physics); Magnetron sputtering; Hafnium; Physics
• Online Access: https://animorepository.dlsu.edu.ph/faculty_research/11594
• Institution: De La Salle University

A simple and cost effective approach to stabilize the sputtering process in the transition zone during reactive high-power impulse magnetron sputtering (HiPIMS) is proposed. The method is based on real-time monitoring and control of the discharge current waveforms. To stabilize the process condition...