Room-temperature visible electroluminescence from aluminum nitride thin film embedded with aluminum nanocrystals

In this brief, room-temperature visible electroluminescence (EL) from aluminum nitride (AlN) thin films containing aluminum nanocrystals (nc-Al) prepared by a radio-frequency magnetron sputtering technique is reported. The EL shows a broad spectrum peaked at 565 nm (2.19 eV) when a negative gate vol...

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Main Authors: Yang, Ming, Liu, Yang, Ding, Liang, Wong, Jen It, Liu, Zhen, Zhang, Sam, Zhang, Wali, Zhu, Fu Rong, Chen, Tupei
其他作者: School of Electrical and Electronic Engineering
格式: Article
語言:English
出版: 2010
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在線閱讀:https://hdl.handle.net/10356/101982
http://hdl.handle.net/10220/6410
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總結:In this brief, room-temperature visible electroluminescence (EL) from aluminum nitride (AlN) thin films containing aluminum nanocrystals (nc-Al) prepared by a radio-frequency magnetron sputtering technique is reported. The EL shows a broad spectrum peaked at 565 nm (2.19 eV) when a negative gate voltage is applied. A linear relationship between the EL and the current transport in the nc-Al/AlN thin film system is observed, and both the current transport and the EL intensity exhibit a power-law dependence on the gate voltage. These results are explained in terms of the formation of percolation networks of tunneling paths by the nc-Al arrays and the radiative recombination of the injected electrons and holes via the deep-level defects at the locations of nc-Al along the tunneling paths.