A review of interferometric techniques with possible improvement in pattern resolution using near-field patterning
In this paper, we will be initially doing review on the advancement of interference lithography (IL) which is a wellestablished technique for its facile, efficient, and economical approach to achieve large-scale patterning in a wide variety of substrates at sub-wavelength resolution. Following this,...
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| Main Authors: | , |
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| Other Authors: | |
| Format: | Conference or Workshop Item |
| Language: | English |
| Published: |
2018
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| Subjects: | |
| Online Access: | https://hdl.handle.net/10356/102552 http://hdl.handle.net/10220/47259 |
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| Institution: | Nanyang Technological University |
| Language: | English |
| Summary: | In this paper, we will be initially doing review on the advancement of interference lithography (IL) which is a wellestablished technique for its facile, efficient, and economical approach to achieve large-scale patterning in a wide variety of substrates at sub-wavelength resolution. Following this, we have configured a two-beam IL patterning system to achieve patterns in a photoresist and verified against the theoretically calculated results. This work will be further extended using near-field patterning techniques to improve the resolution of the pattern as compared to the current conventional IL system. It is envisaged that the obtained initial results can be employed in a graphene substrate for further research and applications in the area of flexible electronics. |
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