A review of interferometric techniques with possible improvement in pattern resolution using near-field patterning
In this paper, we will be initially doing review on the advancement of interference lithography (IL) which is a wellestablished technique for its facile, efficient, and economical approach to achieve large-scale patterning in a wide variety of substrates at sub-wavelength resolution. Following this,...
Saved in:
Main Authors: | , |
---|---|
Other Authors: | |
Format: | Conference or Workshop Item |
Language: | English |
Published: |
2018
|
Subjects: | |
Online Access: | https://hdl.handle.net/10356/102552 http://hdl.handle.net/10220/47259 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | Nanyang Technological University |
Language: | English |
Be the first to leave a comment!