A review of interferometric techniques with possible improvement in pattern resolution using near-field patterning

• Main Authors: Pae, J. Y., Murukeshan, Vadakke Matham
• Other Authors: Asundi, Anand K.
• Format: Conference or Workshop Item
• Language: English
• Published: 2018
• Subjects: DRNTU::Engineering::Mechanical engineering; Interference Lithography; Near-field
• Online Access: https://hdl.handle.net/10356/102552; http://hdl.handle.net/10220/47259
• Institution: Nanyang Technological University

In this paper, we will be initially doing review on the advancement of interference lithography (IL) which is a wellestablished technique for its facile, efficient, and economical approach to achieve large-scale patterning in a wide variety of substrates at sub-wavelength resolution. Following this,...