Lithography in UV photoresist using NSOM

Lithography in UV photoresist using NSOM

10.1117/12.595859

Saved in:
Bibliographic Details
Main Authors: Lin, Y., Hong, M.H., Wang, W.J., Law, Y.Z., Chong, T.C.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Subjects:
Femtosecond laser
Lithography
Near-field scanning optical microscopy
UV photoresist
Online Access:http://scholarbank.nus.edu.sg/handle/10635/70808
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/70808

Similar Items