Lithography in UV photoresist using NSOM
10.1117/12.595859
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sg-nus-scholar.10635-708082023-10-29T21:43:05Z Lithography in UV photoresist using NSOM Lin, Y. Hong, M.H. Wang, W.J. Law, Y.Z. Chong, T.C. ELECTRICAL & COMPUTER ENGINEERING Femtosecond laser Lithography Near-field scanning optical microscopy UV photoresist 10.1117/12.595859 Proceedings of SPIE - The International Society for Optical Engineering 5662 77-82 PSISD 2014-06-19T03:16:30Z 2014-06-19T03:16:30Z 2004 Conference Paper Lin, Y., Hong, M.H., Wang, W.J., Law, Y.Z., Chong, T.C. (2004). Lithography in UV photoresist using NSOM. Proceedings of SPIE - The International Society for Optical Engineering 5662 : 77-82. ScholarBank@NUS Repository. https://doi.org/10.1117/12.595859 0277786X http://scholarbank.nus.edu.sg/handle/10635/70808 000224751600013 Scopus |
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Femtosecond laser Lithography Near-field scanning optical microscopy UV photoresist |
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Femtosecond laser Lithography Near-field scanning optical microscopy UV photoresist Lin, Y. Hong, M.H. Wang, W.J. Law, Y.Z. Chong, T.C. Lithography in UV photoresist using NSOM |
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10.1117/12.595859 |
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ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING Lin, Y. Hong, M.H. Wang, W.J. Law, Y.Z. Chong, T.C. |
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Conference or Workshop Item |
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Lin, Y. Hong, M.H. Wang, W.J. Law, Y.Z. Chong, T.C. |
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Lin, Y. |
title |
Lithography in UV photoresist using NSOM |
title_short |
Lithography in UV photoresist using NSOM |
title_full |
Lithography in UV photoresist using NSOM |
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Lithography in UV photoresist using NSOM |
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Lithography in UV photoresist using NSOM |
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lithography in uv photoresist using nsom |
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2014 |
url |
http://scholarbank.nus.edu.sg/handle/10635/70808 |
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