Lithography in UV photoresist using NSOM

• Main Authors: Lin, Y., Hong, M.H., Wang, W.J., Law, Y.Z., Chong, T.C.
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Conference or Workshop Item
• Published: 2014
• Subjects: Femtosecond laser; Lithography; Near-field scanning optical microscopy; UV photoresist
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/70808
• Institution: National University of Singapore

10.1117/12.595859