Optimization of 3D SU-8 microstructures using mask-less lithography and ultraviolet exposure

Optimization of 3D SU-8 microstructures using mask-less lithography and ultraviolet exposure

Maskless lithography has a broad prospect in fabricating 3D microstructures by negative photoresist SU-8, which is popular in MEMS and microfluidics application. Thus, in this dissertation project, I study the optimal UV exposure condition for the DMD-based maskless lithography and build some 3D mic...

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Bibliographic Details
Main Author: Zhu, Junlei
Other Authors: Lee Seok Woo
Format: Thesis-Master by Coursework
Language:English
Published: Nanyang Technological University 2024
Subjects:
Chemistry
Engineering
Physics
Maskless lithography
UV exposure
SU-8
Online Access:https://hdl.handle.net/10356/179410
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Institution: Nanyang Technological University
Language: English

Internet

https://hdl.handle.net/10356/179410

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