Optimization of 3D SU-8 microstructures using mask-less lithography and ultraviolet exposure
Maskless lithography has a broad prospect in fabricating 3D microstructures by negative photoresist SU-8, which is popular in MEMS and microfluidics application. Thus, in this dissertation project, I study the optimal UV exposure condition for the DMD-based maskless lithography and build some 3D mic...
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Main Author: | Zhu, Junlei |
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Other Authors: | Lee Seok Woo |
Format: | Thesis-Master by Coursework |
Language: | English |
Published: |
Nanyang Technological University
2024
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Online Access: | https://hdl.handle.net/10356/179410 |
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Institution: | Nanyang Technological University |
Language: | English |
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