Reverse nanoimprint lithography for fabrication of nanostructures

Reverse nanoimprint lithography for fabrication of nanostructures

10.1166/nnl.2012.1424

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Bibliographic Details
Main Authors: Tavakkoli, A.K.G., Ranjbar, M., Piramanayagam, S.N., Wong, S.K., Poh, W.C., Sbiaa, R., Chong, T.C.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Subjects:
Molding Pressure
Nanofabrication
Residual Layer
Reverse Nanoimprint Lithography
Online Access:http://scholarbank.nus.edu.sg/handle/10635/57272
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Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/57272

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