Reverse nanoimprint lithography for fabrication of nanostructures

Reverse nanoimprint lithography for fabrication of nanostructures

10.1166/nnl.2012.1424

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Bibliographic Details
Main Authors:	Tavakkoli, A.K.G., Ranjbar, M., Piramanayagam, S.N., Wong, S.K., Poh, W.C., Sbiaa, R., Chong, T.C.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Subjects:	Molding Pressure Nanofabrication Residual Layer Reverse Nanoimprint Lithography
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/57272
Tags:	Add Tag No Tags, Be the first to tag this record!
Institution:	National University of Singapore

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