Study of the mask-less lithography system and its optimization for high resolution pattern of negative photoresist

Study of the mask-less lithography system and its optimization for high resolution pattern of negative photoresist

This dissertation reveals the optimal UV conditions for DMD-based maskless lithography system using SU-8 3010 and SU-8 3050 as photoresists. For SU-8 3010 under 10x and 20x lens, the optimal UV conditions are 60% and 80% UV intensity, 400 seconds and 75 seconds of UV exposure duration. For SU-8 3050...

Full description

Saved in:
Bibliographic Details
Main Author: Yuan, Chenjie
Other Authors: Lee Seok Woo
Format: Thesis-Master by Coursework
Language:English
Published: Nanyang Technological University 2024
Subjects:
Engineering
SU-8
DMD
Maskless lithography
Micro 3D structure
Online Access:https://hdl.handle.net/10356/177629
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: Nanyang Technological University
Language: English

Internet

https://hdl.handle.net/10356/177629

Similar Items