Study of the mask-less lithography system and its optimization for high resolution pattern of negative photoresist

• المؤلف الرئيسي: Yuan, Chenjie
• مؤلفون آخرون: Lee Seok Woo
• التنسيق: Thesis-Master by Coursework
• اللغة: English
• منشور في: Nanyang Technological University 2024
• الموضوعات: Engineering; SU-8; DMD; Maskless lithography; Micro 3D structure
• الوصول للمادة أونلاين: https://hdl.handle.net/10356/177629
• المؤسسة: Nanyang Technological University

This dissertation reveals the optimal UV conditions for DMD-based maskless lithography system using SU-8 3010 and SU-8 3050 as photoresists. For SU-8 3010 under 10x and 20x lens, the optimal UV conditions are 60% and 80% UV intensity, 400 seconds and 75 seconds of UV exposure duration. For SU-8 3050...