Study of the mask-less lithography system and its optimization for high resolution pattern of negative photoresist

• Main Author: Yuan, Chenjie
• Other Authors: Lee Seok Woo
• Format: Thesis-Master by Coursework
• Language: English
• Published: Nanyang Technological University 2024
• Subjects: Engineering; SU-8; DMD; Maskless lithography; Micro 3D structure
• Online Access: https://hdl.handle.net/10356/177629
• Institution: Nanyang Technological University

This dissertation reveals the optimal UV conditions for DMD-based maskless lithography system using SU-8 3010 and SU-8 3050 as photoresists. For SU-8 3010 under 10x and 20x lens, the optimal UV conditions are 60% and 80% UV intensity, 400 seconds and 75 seconds of UV exposure duration. For SU-8 3050 under 10x and 20x lens, the optimal UV conditions are 60% and 50% UV intensity, 400 seconds and 200 seconds of UV exposure duration. By using the optimal conditions for the SU-8 3050 under 10x lens, procedures for fabricating the micro 3D structure were investigated, four micro 3D structures were fabricated and evaluated using SEM.