Study of the mask-less lithography system and its optimization for high resolution pattern of negative photoresist
This dissertation reveals the optimal UV conditions for DMD-based maskless lithography system using SU-8 3010 and SU-8 3050 as photoresists. For SU-8 3010 under 10x and 20x lens, the optimal UV conditions are 60% and 80% UV intensity, 400 seconds and 75 seconds of UV exposure duration. For SU-8 3050...
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| Format: | Thesis-Master by Coursework |
| Language: | English |
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Nanyang Technological University
2024
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| Online Access: | https://hdl.handle.net/10356/177629 |
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| Institution: | Nanyang Technological University |
| Language: | English |