Optimization of 3D SU-8 microstructures using mask-less lithography and ultraviolet exposure

• Main Author: Zhu, Junlei
• Other Authors: Lee Seok Woo
• Format: Thesis-Master by Coursework
• Language: English
• Published: Nanyang Technological University 2024
• Subjects: Chemistry; Engineering; Physics; Maskless lithography; UV exposure; SU-8
• Online Access: https://hdl.handle.net/10356/179410
• Institution: Nanyang Technological University

Maskless lithography has a broad prospect in fabricating 3D microstructures by negative photoresist SU-8, which is popular in MEMS and microfluidics application. Thus, in this dissertation project, I study the optimal UV exposure condition for the DMD-based maskless lithography and build some 3D mic...