Lithography in UV photoresist using NSOM

Lithography in UV photoresist using NSOM

10.1117/12.595859

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Bibliographic Details
Main Authors: Lin, Y., Hong, M.H., Wang, W.J., Law, Y.Z., Chong, T.C.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Subjects:
Femtosecond laser
Lithography
Near-field scanning optical microscopy
UV photoresist
Online Access:http://scholarbank.nus.edu.sg/handle/10635/70808
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Institution: National University of Singapore
Description
Summary:10.1117/12.595859

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