“Multipoint force feedback” leveling of massively parallel tip arrays in scanning probe lithography
Nanoscale patterning with massively parallel 2D array tips is of significant interest in scanning probe lithography. A challenging task for tip-based large area nanolithography is maintaining parallel tip arrays at the same contact point with a sample substrate in order to pattern a uniform array. H...
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| Main Authors: | , , , , , , , |
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| Other Authors: | |
| Format: | Article |
| Language: | English |
| Published: |
2015
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| Subjects: | |
| Online Access: | https://hdl.handle.net/10356/106024 http://hdl.handle.net/10220/26285 |
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| Institution: | Nanyang Technological University |
| Language: | English |
| Summary: | Nanoscale patterning with massively parallel 2D array tips is of significant interest in scanning probe lithography. A challenging task for tip-based large area nanolithography is maintaining parallel tip arrays at the same contact point with a sample substrate in order to pattern a uniform array. Here, polymer pen lithography is demonstrated with a novel leveling method to account for the magnitude and direction of the total applied force of tip arrays by a multipoint force sensing structure integrated into the tip holder. This high-precision approach results in a 0.001° slope of feature edge length variation over 1 cm wide tip arrays. The position sensitive leveling operates in a fully automated manner and is applicable to recently developed scanning probe lithography techniques of various kinds which can enable “desktop nanofabrication.” |
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