Novel processes for an Al2O3/AlN composite system as dielectric substrate for microelectronics application

Recent development of higher power and higher speed in integrated circuits has led to a corresponding demand in improvement for dielectric substrate materials. Conventional Al2O3 system has probably reached its maximum possible performance, with AlN being a prospective alternative, due to its signif...

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Bibliographic Details
Main Author: Sun, Li Min.
Other Authors: Boey, Freddy Yin Chiang
Format: Theses and Dissertations
Language:English
Published: 2008
Subjects:
Online Access:http://hdl.handle.net/10356/13469
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Institution: Nanyang Technological University
Language: English
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