Large photothermal effect in sub-40 nm h-BN nanostructures patterned via high-resolution ion beam

The controlled nanoscale patterning of 2D materials is a promising approach for engineering the optoelectronic, thermal, and mechanical properties of these materials to achieve novel functionalities and devices. Herein, high-resolution patterning of hexagonal boron nitride (h-BN) is demonstrated via...

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Main Authors: López, Josué J, Ambrosio, Antonio, Dai, Siyuan, Huynh, Chuong, Bell, David C, Lin, Xiao, Rivera, Nicholas, Huang, Shengxi, Ma, Qiong, Eyhusen, Soeren, Kaminer, Ido E, Watanabe, Kenji, Taniguchi, Takashi, Kong, Jing, Basov, Dimitri N, Jarillo-Herrero, Pablo, Soljačić, Marin
Other Authors: School of Physical and Mathematical Sciences
Format: Article
Language:English
Published: 2020
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Online Access:https://hdl.handle.net/10356/137226
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Institution: Nanyang Technological University
Language: English
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spelling sg-ntu-dr.10356-1372262023-02-28T19:25:12Z Large photothermal effect in sub-40 nm h-BN nanostructures patterned via high-resolution ion beam López, Josué J Ambrosio, Antonio Dai, Siyuan Huynh, Chuong Bell, David C Lin, Xiao Rivera, Nicholas Huang, Shengxi Ma, Qiong Eyhusen, Soeren Kaminer, Ido E Watanabe, Kenji Taniguchi, Takashi Kong, Jing Basov, Dimitri N Jarillo-Herrero, Pablo Soljačić, Marin School of Physical and Mathematical Sciences Science::Physics 2D Materials Helium and Neon Ion Beam Fabrication The controlled nanoscale patterning of 2D materials is a promising approach for engineering the optoelectronic, thermal, and mechanical properties of these materials to achieve novel functionalities and devices. Herein, high-resolution patterning of hexagonal boron nitride (h-BN) is demonstrated via both helium and neon ion beams and an optimal dosage range for both ions that serve as a baseline for insulating 2D materials is identified. Through this nanofabrication approach, a grating with a 35 nm pitch, individual structure sizes down to 20 nm, and additional nanostructures created by patterning crystal step edges are demonstrated. Raman spectroscopy is used to study the defects induced by the ion beam patterning and is correlated to scanning probe microscopy. Photothermal and scanning near-field optical microscopy measure the resulting near-field absorption and scattering of the nanostructures. These measurements reveal a large photothermal expansion of nanostructured h-BN that is dependent on the height to width aspect ratio of the nanostructures. This effect is attributed to the large anisotropy of the thermal expansion coefficients of h-BN and the nanostructuring implemented. The photothermal expansion should be present in other van der Waals materials with large anisotropy and can lead to applications such as nanomechanical switches driven by light. Accepted version 2020-03-09T08:29:08Z 2020-03-09T08:29:08Z 2018 Journal Article López, J. J., Ambrosio, A., Dai, S., Huynh, C., Bell, D. C., Lin, X., . . . Soljačić, M. (2018). Large photothermal effect in sub‐40 nm h‐BN nanostructures patterned via high‐resolution ion beam. Small, 14(22), 1800072-. doi:10.1002/smll.201800072 1613-6810 https://hdl.handle.net/10356/137226 10.1002/smll.201800072 29687603 2-s2.0-85045841848 22 14 1800072 (1 of 11) 1800072 (11 of 11) en Small This is the peer reviewed version of the following article: López, J. J., Ambrosio, A., Dai, S., Huynh, C., Bell, D. C., Lin, X., . . . Soljačić, M. (2018). Large photothermal effect in sub‐40 nm h‐BN nanostructures patterned via high‐resolution ion beam. Small, 14(22), 1800072-, which has been published in final form at https://doi.org/10.1002/smll.201800072. This article may be used for non-commercial purposes in accordance with Wiley Terms and Conditions for Use of Self-Archived Versions. application/pdf
institution Nanyang Technological University
building NTU Library
continent Asia
country Singapore
Singapore
content_provider NTU Library
collection DR-NTU
language English
topic Science::Physics
2D Materials
Helium and Neon Ion Beam Fabrication
spellingShingle Science::Physics
2D Materials
Helium and Neon Ion Beam Fabrication
López, Josué J
Ambrosio, Antonio
Dai, Siyuan
Huynh, Chuong
Bell, David C
Lin, Xiao
Rivera, Nicholas
Huang, Shengxi
Ma, Qiong
Eyhusen, Soeren
Kaminer, Ido E
Watanabe, Kenji
Taniguchi, Takashi
Kong, Jing
Basov, Dimitri N
Jarillo-Herrero, Pablo
Soljačić, Marin
Large photothermal effect in sub-40 nm h-BN nanostructures patterned via high-resolution ion beam
description The controlled nanoscale patterning of 2D materials is a promising approach for engineering the optoelectronic, thermal, and mechanical properties of these materials to achieve novel functionalities and devices. Herein, high-resolution patterning of hexagonal boron nitride (h-BN) is demonstrated via both helium and neon ion beams and an optimal dosage range for both ions that serve as a baseline for insulating 2D materials is identified. Through this nanofabrication approach, a grating with a 35 nm pitch, individual structure sizes down to 20 nm, and additional nanostructures created by patterning crystal step edges are demonstrated. Raman spectroscopy is used to study the defects induced by the ion beam patterning and is correlated to scanning probe microscopy. Photothermal and scanning near-field optical microscopy measure the resulting near-field absorption and scattering of the nanostructures. These measurements reveal a large photothermal expansion of nanostructured h-BN that is dependent on the height to width aspect ratio of the nanostructures. This effect is attributed to the large anisotropy of the thermal expansion coefficients of h-BN and the nanostructuring implemented. The photothermal expansion should be present in other van der Waals materials with large anisotropy and can lead to applications such as nanomechanical switches driven by light.
author2 School of Physical and Mathematical Sciences
author_facet School of Physical and Mathematical Sciences
López, Josué J
Ambrosio, Antonio
Dai, Siyuan
Huynh, Chuong
Bell, David C
Lin, Xiao
Rivera, Nicholas
Huang, Shengxi
Ma, Qiong
Eyhusen, Soeren
Kaminer, Ido E
Watanabe, Kenji
Taniguchi, Takashi
Kong, Jing
Basov, Dimitri N
Jarillo-Herrero, Pablo
Soljačić, Marin
format Article
author López, Josué J
Ambrosio, Antonio
Dai, Siyuan
Huynh, Chuong
Bell, David C
Lin, Xiao
Rivera, Nicholas
Huang, Shengxi
Ma, Qiong
Eyhusen, Soeren
Kaminer, Ido E
Watanabe, Kenji
Taniguchi, Takashi
Kong, Jing
Basov, Dimitri N
Jarillo-Herrero, Pablo
Soljačić, Marin
author_sort López, Josué J
title Large photothermal effect in sub-40 nm h-BN nanostructures patterned via high-resolution ion beam
title_short Large photothermal effect in sub-40 nm h-BN nanostructures patterned via high-resolution ion beam
title_full Large photothermal effect in sub-40 nm h-BN nanostructures patterned via high-resolution ion beam
title_fullStr Large photothermal effect in sub-40 nm h-BN nanostructures patterned via high-resolution ion beam
title_full_unstemmed Large photothermal effect in sub-40 nm h-BN nanostructures patterned via high-resolution ion beam
title_sort large photothermal effect in sub-40 nm h-bn nanostructures patterned via high-resolution ion beam
publishDate 2020
url https://hdl.handle.net/10356/137226
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