Material characterizations of high refractive films for active waveguide

Material characterizations of high refractive films for active waveguide

The fabrication of SiON and Erbium (Er) doped SiON films have been successfully developed using the sputtering and co-sputtering techniques. The properties of the films such as the optical properties, the compositions, the chemical bonds and the microstructures, have been well characterized and s...

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Main Author: Kantisara Pita.
Other Authors: School of Electrical and Electronic Engineering
Format: Research Report
Language:English
Published: 2008
Subjects:
DRNTU::Engineering::Electrical and electronic engineering::Antennas, wave guides, microwaves, radar, radio
Online Access:http://hdl.handle.net/10356/14234
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Institution: Nanyang Technological University
Language: English
id sg-ntu-dr.10356-14234
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spelling sg-ntu-dr.10356-142342023-03-04T03:22:48Z Material characterizations of high refractive films for active waveguide Kantisara Pita. School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Antennas, wave guides, microwaves, radar, radio The fabrication of SiON and Erbium (Er) doped SiON films have been successfully developed using the sputtering and co-sputtering techniques. The properties of the films such as the optical properties, the compositions, the chemical bonds and the microstructures, have been well characterized and studied using the spectroscopy ellipsometry, Rutherford Backscattering, Fourier Transform Infrared and Raman spectroscopy/XRD measurements respectively. Low optical films with desired refractive index, in the range of 1.47 – 1.81 at 1550 nm, and compositions can be easily fabricated. 2008-11-06T06:24:43Z 2008-11-06T06:24:43Z 2007 2007 Research Report http://hdl.handle.net/10356/14234 en 32 p. application/pdf
institution Nanyang Technological University
building NTU Library
continent Asia
country Singapore
Singapore
content_provider NTU Library
collection DR-NTU
language English
topic DRNTU::Engineering::Electrical and electronic engineering::Antennas, wave guides, microwaves, radar, radio
spellingShingle DRNTU::Engineering::Electrical and electronic engineering::Antennas, wave guides, microwaves, radar, radio
Kantisara Pita.
Material characterizations of high refractive films for active waveguide
description The fabrication of SiON and Erbium (Er) doped SiON films have been successfully developed using the sputtering and co-sputtering techniques. The properties of the films such as the optical properties, the compositions, the chemical bonds and the microstructures, have been well characterized and studied using the spectroscopy ellipsometry, Rutherford Backscattering, Fourier Transform Infrared and Raman spectroscopy/XRD measurements respectively. Low optical films with desired refractive index, in the range of 1.47 – 1.81 at 1550 nm, and compositions can be easily fabricated.
author2 School of Electrical and Electronic Engineering
author_facet School of Electrical and Electronic Engineering
Kantisara Pita.
format Research Report
author Kantisara Pita.
author_sort Kantisara Pita.
title Material characterizations of high refractive films for active waveguide
title_short Material characterizations of high refractive films for active waveguide
title_full Material characterizations of high refractive films for active waveguide
title_fullStr Material characterizations of high refractive films for active waveguide
title_full_unstemmed Material characterizations of high refractive films for active waveguide
title_sort material characterizations of high refractive films for active waveguide
publishDate 2008
url http://hdl.handle.net/10356/14234
_version_ 1759856134133383168

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