Electron radiation-induced material diffusion and nanocrystallization in nanostructured amorphous CoFeB thin film

• Main Authors: Liu, Binghai, Tahmasebi, Taiebeh, Ong, Kenny, Teo, Hanwei, Mo, Zhiqiang, Lam, Jeffrey, Tan, Pik Kee, Zhao, Yuzhe, Dong, Zhili, Houssameddine, Dimitri, Wang, Jacob, Xue, Junming, Mai, Zhihong
• Other Authors: School of Materials Science and Engineering
• Format: Article
• Language: English
• Published: 2020
• Subjects: Engineering::Materials; Electron Beam Radiation; Transmission Electron Microscopy
• Online Access: https://hdl.handle.net/10356/143601
• Institution: Nanyang Technological University

Transmission electron microscopy (TEM) is widely used for physical characterization of CoFeB based magnetic tunneling junctions (MTJ) with its atomic-scale resolution. However, highly energetic electron radiation during TEM analysis may cause phase and microstructure modification of CoFeB and its as...