Mechanism and effects of surface morphology on absorption characteristics in ultrashort pulse laser processing of sapphire

• المؤلفون الرئيسيون: Lye, Celescia Siew Mun, Wang, Z. K., Lam, Yee Cheong
• مؤلفون آخرون: School of Mechanical and Aerospace Engineering
• التنسيق: مقال
• اللغة: English
• منشور في: 2021
• الموضوعات: Engineering::Mechanical engineering; Total Internal Reflection; Surface Morphology
• الوصول للمادة أونلاين: https://hdl.handle.net/10356/146198

For ultrashort pulse laser processing of a sapphire wafer, nonlinear absorption of laser energy at sufficiently high laser intensity is essential. This study found that in ultrashort pulse laser processing of a sapphire wafer, its surface morphology can have a significant effect on nonlinear absorpt...