Process control and predictive model for machine data in epitaxy growths

Semiconductor epitaxy growths are very popular in microfabrication and optoelectronic devices fabrications. In the epitaxy process, reactors generate a lot of data every second. This data could be used to improve processes through automation and analytics. This report proposes practical solutions/pr...

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Bibliographic Details
Main Author: Sim, Stanley Jia Yi
Other Authors: Tang Xiaohong
Format: Final Year Project
Language:English
Published: Nanyang Technological University 2021
Subjects:
Online Access:https://hdl.handle.net/10356/150450
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Institution: Nanyang Technological University
Language: English
Description
Summary:Semiconductor epitaxy growths are very popular in microfabrication and optoelectronic devices fabrications. In the epitaxy process, reactors generate a lot of data every second. This data could be used to improve processes through automation and analytics. This report proposes practical solutions/proof-of-concepts that are showcased with the wealth of open-source resources readily available online namely- Google Cloud Platform (free tier/credits) for automation and analytics, and Python libraries such as Numpy, Pandas and TensorFlow/Keras for data processing and machine learning.