Process control and predictive model for machine data in epitaxy growths

• Main Author: Sim, Stanley Jia Yi
• Other Authors: Tang Xiaohong
• Format: Final Year Project
• Language: English
• Published: Nanyang Technological University 2021
• Subjects: Engineering::Electrical and electronic engineering::Semiconductors
• Online Access: https://hdl.handle.net/10356/150450
• Institution: Nanyang Technological University

Semiconductor epitaxy growths are very popular in microfabrication and optoelectronic devices fabrications. In the epitaxy process, reactors generate a lot of data every second. This data could be used to improve processes through automation and analytics. This report proposes practical solutions/pr...