Microstructure and through-film electrical characteristics of vertically aligned amorphous carbon films

The microstructure and electrical properties of in-situ annealed carbon films is studied in this paper. In-situ annealing (150 °C to 600 °C) was done during the deposition of carbon films with −300 V substrate bias. Transmission electron microscopy and two points electrical probing studies were perf...

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Bibliographic Details
Main Authors: Tan, Chong Wei, Shakerzadeh, Maziar, Teo, Edwin Hang Tong, Tay, Beng Kang
Other Authors: School of Electrical and Electronic Engineering
Format: Article
Language:English
Published: 2021
Subjects:
Online Access:https://hdl.handle.net/10356/151193
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Institution: Nanyang Technological University
Language: English