Stability of wafer-scale thin films of vertically aligned hexagonal BN nanosheets exposed to high-energy ions and reactive atomic oxygen

• المؤلفون الرئيسيون: Huang, Shiyong, Ng, Zhi Kai, Li, Hongling, Chaturvedi, Apoorva, Lim, Mark Jian Wei, Tay, Roland Yingjie, Teo, Edwin Hang Tong, Xu, Shuyan, Ostrikov, Kostya Ken, Tsang, Siu Hon
• مؤلفون آخرون: School of Electrical and Electronic Engineering
• التنسيق: مقال
• اللغة: English
• منشور في: 2023
• الموضوعات: Engineering::Materials; Inductively Coupled Plasmas; Chemical Vapor Deposition
• الوصول للمادة أونلاين: https://hdl.handle.net/10356/165129

Stability of advanced functional materials subjected to extreme conditions involving ion bombardment, radiation, or reactive chemicals is crucial for diverse applications. Here we demonstrate the excellent stability of wafer-scale thin films of vertically aligned hexagonal BN nanosheets (hBNNS) expo...