Stability of wafer-scale thin films of vertically aligned hexagonal BN nanosheets exposed to high-energy ions and reactive atomic oxygen

• Main Authors: Huang, Shiyong, Ng, Zhi Kai, Li, Hongling, Chaturvedi, Apoorva, Lim, Mark Jian Wei, Tay, Roland Yingjie, Teo, Edwin Hang Tong, Xu, Shuyan, Ostrikov, Kostya Ken, Tsang, Siu Hon
• Other Authors: School of Electrical and Electronic Engineering
• Format: Article
• Language: English
• Published: 2023
• Subjects: Engineering::Materials; Inductively Coupled Plasmas; Chemical Vapor Deposition
• Online Access: https://hdl.handle.net/10356/165129
• Institution: Nanyang Technological University

Stability of advanced functional materials subjected to extreme conditions involving ion bombardment, radiation, or reactive chemicals is crucial for diverse applications. Here we demonstrate the excellent stability of wafer-scale thin films of vertically aligned hexagonal BN nanosheets (hBNNS) expo...