Optimization of molybdenum electrode properties in ScAlN deposition process

The project mainly concentrates on optimizing the Molybdenum thin film properties by high-power magnetron sputtering. Three paramters are mainly researched including power, Argon pressure and seed-layer thickness. A best method is found to achieve best properties of Mo thin film.

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Bibliographic Details
Main Author: Pan, Ziran
Other Authors: Tay Beng Kang
Format: Thesis-Master by Coursework
Language:English
Published: Nanyang Technological University 2023
Subjects:
Online Access:https://hdl.handle.net/10356/166171
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Institution: Nanyang Technological University
Language: English
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spelling sg-ntu-dr.10356-1661712023-04-16T05:19:47Z Optimization of molybdenum electrode properties in ScAlN deposition process Pan, Ziran Tay Beng Kang School of Electrical and Electronic Engineering EBKTAY@ntu.edu.sg Engineering::Electrical and electronic engineering The project mainly concentrates on optimizing the Molybdenum thin film properties by high-power magnetron sputtering. Three paramters are mainly researched including power, Argon pressure and seed-layer thickness. A best method is found to achieve best properties of Mo thin film. Master of Science (Green Electronics) 2023-04-16T05:19:47Z 2023-04-16T05:19:47Z 2023 Thesis-Master by Coursework Pan, Z. (2023). Optimization of molybdenum electrode properties in ScAlN deposition process. Master's thesis, Nanyang Technological University, Singapore. https://hdl.handle.net/10356/166171 https://hdl.handle.net/10356/166171 en ISM-DISS-03709 application/pdf Nanyang Technological University
institution Nanyang Technological University
building NTU Library
continent Asia
country Singapore
Singapore
content_provider NTU Library
collection DR-NTU
language English
topic Engineering::Electrical and electronic engineering
spellingShingle Engineering::Electrical and electronic engineering
Pan, Ziran
Optimization of molybdenum electrode properties in ScAlN deposition process
description The project mainly concentrates on optimizing the Molybdenum thin film properties by high-power magnetron sputtering. Three paramters are mainly researched including power, Argon pressure and seed-layer thickness. A best method is found to achieve best properties of Mo thin film.
author2 Tay Beng Kang
author_facet Tay Beng Kang
Pan, Ziran
format Thesis-Master by Coursework
author Pan, Ziran
author_sort Pan, Ziran
title Optimization of molybdenum electrode properties in ScAlN deposition process
title_short Optimization of molybdenum electrode properties in ScAlN deposition process
title_full Optimization of molybdenum electrode properties in ScAlN deposition process
title_fullStr Optimization of molybdenum electrode properties in ScAlN deposition process
title_full_unstemmed Optimization of molybdenum electrode properties in ScAlN deposition process
title_sort optimization of molybdenum electrode properties in scaln deposition process
publisher Nanyang Technological University
publishDate 2023
url https://hdl.handle.net/10356/166171
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