Flexible TiN/Ge photodetectors with enhanced responsivity via localized surface plasmon resonance and strain modulation

Near infrared (NIR) photodetectors (PDs) have attracted great attention for their applications in the field of optical telecommunication. Ge is one of the most attractive materials for the active region of the NIR PDs due to complementary metal oxide semiconductor (CMOS) compatibility and lower band...

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Main Authors: Kim, You Jin, An, Shu, Liao, Yikai, Huang, Po-Rei, Son, Bongkwon, Tan, Chuan Seng, Chang, Guo-En, Kim, Munho
其他作者: School of Electrical and Electronic Engineering
格式: Article
語言:English
出版: 2023
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在線閱讀:https://hdl.handle.net/10356/169318
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機構: Nanyang Technological University
語言: English