Ultrafast electronic relaxation dynamics of atomically thin MoS₂ is accelerated by wrinkling

Strain engineering is an attractive approach for tuning the local optoelectronic properties of transition metal dichalcogenides (TMDs). While strain has been shown to affect the nanosecond carrier recombination dynamics of TMDs, its influence on the sub-picosecond electronic relaxation dynamics is s...

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Main Authors: Xu, Ce, Zhou, Guoqing, Alexeev, Evgeny M., Cadore, Alisson R., Paradisanos, Ioannis, Ott, Anna K., Soavi, Giancarlo, Tongay, Sefaattin, Cerullo, Giulio, Ferrari, Andrea C., Prezhdo, Oleg V., Loh, Zhi-Heng
Other Authors: School of Chemistry, Chemical Engineering and Biotechnology
Format: Article
Language:English
Published: 2023
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Online Access:https://hdl.handle.net/10356/169981
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spelling sg-ntu-dr.10356-1699812024-01-23T07:41:31Z Ultrafast electronic relaxation dynamics of atomically thin MoS₂ is accelerated by wrinkling Xu, Ce Zhou, Guoqing Alexeev, Evgeny M. Cadore, Alisson R. Paradisanos, Ioannis Ott, Anna K. Soavi, Giancarlo Tongay, Sefaattin Cerullo, Giulio Ferrari, Andrea C. Prezhdo, Oleg V. Loh, Zhi-Heng School of Chemistry, Chemical Engineering and Biotechnology School of Physical and Mathematical Sciences Science::Chemistry::Physical chemistry Transition Metal Dichalcogenides Ultrafast Carrier Dynamics Strain engineering is an attractive approach for tuning the local optoelectronic properties of transition metal dichalcogenides (TMDs). While strain has been shown to affect the nanosecond carrier recombination dynamics of TMDs, its influence on the sub-picosecond electronic relaxation dynamics is still unexplored. Here, we employ a combination of time-resolved photoemission electron microscopy (TR-PEEM) and nonadiabatic ab initio molecular dynamics (NAMD) to investigate the ultrafast dynamics of wrinkled multilayer (ML) MoS2 comprising 17 layers. Following 2.41 eV photoexcitation, electronic relaxation at the Γ valley occurs with a time constant of 97 ± 2 fs for wrinkled ML-MoS2 and 120 ± 2 fs for flat ML-MoS2. NAMD shows that wrinkling permits larger amplitude motions of MoS2 layers, relaxes electron-phonon coupling selection rules, perturbs chemical bonding, and increases the electronic density of states. As a result, the nonadiabatic coupling grows and electronic relaxation becomes faster compared to flat ML-MoS2. Our study suggests that the sub-picosecond electronic relaxation dynamics of TMDs is amenable to strain engineering and that applications which require long-lived hot carriers, such as hot-electron-driven light harvesting and photocatalysis, should employ wrinkle-free TMDs. Ministry of Education (MOE) Submitted/Accepted version We acknowledge funding from the Ministry of Education, Singapore (MOE-T2EP50221-0004 and RG1/22), the EU Graphene Flagship, ERC Grants Hetero2D, GIPT, EU Grants GRAP-X, CHARM, EPSRC Grants EP/K01711X/1, EP/K017144/1, EP/N010345/1, EP/L016087/1, EP/V000055/1, and EP/X015742/1, and the U.S. National Science Foundation (CHE-2154367). 2023-08-22T06:30:20Z 2023-08-22T06:30:20Z 2023 Journal Article Xu, C., Zhou, G., Alexeev, E. M., Cadore, A. R., Paradisanos, I., Ott, A. K., Soavi, G., Tongay, S., Cerullo, G., Ferrari, A. C., Prezhdo, O. V. & Loh, Z. (2023). Ultrafast electronic relaxation dynamics of atomically thin MoS₂ is accelerated by wrinkling. ACS Nano. https://dx.doi.org/10.1021/acsnano.3c02917 1936-0851 https://hdl.handle.net/10356/169981 10.1021/acsnano.3c02917 37581747 en MOE-T2EP50221-0004 RG1/22 ACS Nano 10.21979/N9/8PBMPA This document is the Accepted Manuscript version of a Published Work that appeared in final form in ACS Nano, copyright © 2023 American Chemical Society, after peer review and technical editing by the publisher. To access the final edited and published work see https://doi.org/10.1021/acsnano.3c02917. application/pdf application/pdf
institution Nanyang Technological University
building NTU Library
continent Asia
country Singapore
Singapore
content_provider NTU Library
collection DR-NTU
language English
topic Science::Chemistry::Physical chemistry
Transition Metal Dichalcogenides
Ultrafast Carrier Dynamics
spellingShingle Science::Chemistry::Physical chemistry
Transition Metal Dichalcogenides
Ultrafast Carrier Dynamics
Xu, Ce
Zhou, Guoqing
Alexeev, Evgeny M.
Cadore, Alisson R.
Paradisanos, Ioannis
Ott, Anna K.
Soavi, Giancarlo
Tongay, Sefaattin
Cerullo, Giulio
Ferrari, Andrea C.
Prezhdo, Oleg V.
Loh, Zhi-Heng
Ultrafast electronic relaxation dynamics of atomically thin MoS₂ is accelerated by wrinkling
description Strain engineering is an attractive approach for tuning the local optoelectronic properties of transition metal dichalcogenides (TMDs). While strain has been shown to affect the nanosecond carrier recombination dynamics of TMDs, its influence on the sub-picosecond electronic relaxation dynamics is still unexplored. Here, we employ a combination of time-resolved photoemission electron microscopy (TR-PEEM) and nonadiabatic ab initio molecular dynamics (NAMD) to investigate the ultrafast dynamics of wrinkled multilayer (ML) MoS2 comprising 17 layers. Following 2.41 eV photoexcitation, electronic relaxation at the Γ valley occurs with a time constant of 97 ± 2 fs for wrinkled ML-MoS2 and 120 ± 2 fs for flat ML-MoS2. NAMD shows that wrinkling permits larger amplitude motions of MoS2 layers, relaxes electron-phonon coupling selection rules, perturbs chemical bonding, and increases the electronic density of states. As a result, the nonadiabatic coupling grows and electronic relaxation becomes faster compared to flat ML-MoS2. Our study suggests that the sub-picosecond electronic relaxation dynamics of TMDs is amenable to strain engineering and that applications which require long-lived hot carriers, such as hot-electron-driven light harvesting and photocatalysis, should employ wrinkle-free TMDs.
author2 School of Chemistry, Chemical Engineering and Biotechnology
author_facet School of Chemistry, Chemical Engineering and Biotechnology
Xu, Ce
Zhou, Guoqing
Alexeev, Evgeny M.
Cadore, Alisson R.
Paradisanos, Ioannis
Ott, Anna K.
Soavi, Giancarlo
Tongay, Sefaattin
Cerullo, Giulio
Ferrari, Andrea C.
Prezhdo, Oleg V.
Loh, Zhi-Heng
format Article
author Xu, Ce
Zhou, Guoqing
Alexeev, Evgeny M.
Cadore, Alisson R.
Paradisanos, Ioannis
Ott, Anna K.
Soavi, Giancarlo
Tongay, Sefaattin
Cerullo, Giulio
Ferrari, Andrea C.
Prezhdo, Oleg V.
Loh, Zhi-Heng
author_sort Xu, Ce
title Ultrafast electronic relaxation dynamics of atomically thin MoS₂ is accelerated by wrinkling
title_short Ultrafast electronic relaxation dynamics of atomically thin MoS₂ is accelerated by wrinkling
title_full Ultrafast electronic relaxation dynamics of atomically thin MoS₂ is accelerated by wrinkling
title_fullStr Ultrafast electronic relaxation dynamics of atomically thin MoS₂ is accelerated by wrinkling
title_full_unstemmed Ultrafast electronic relaxation dynamics of atomically thin MoS₂ is accelerated by wrinkling
title_sort ultrafast electronic relaxation dynamics of atomically thin mos₂ is accelerated by wrinkling
publishDate 2023
url https://hdl.handle.net/10356/169981
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