Conductive bridge random access memory

This paper outlines an exploration into the electrical behavior of conductive bridge random-access memory (CBRAM), featuring a Silver (Ag) top electrode (TE), with the switching layer comprised of Germanium Sulfide (GeS) and Molybdenum Disulfide (MoS2), while the bottom electrode (BE) utilises...

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Bibliographic Details
Main Author: Goh, Zu Hong
Other Authors: Ang Diing Shenp
Format: Final Year Project
Language:English
Published: Nanyang Technological University 2024
Subjects:
Online Access:https://hdl.handle.net/10356/176304
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Institution: Nanyang Technological University
Language: English
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Summary:This paper outlines an exploration into the electrical behavior of conductive bridge random-access memory (CBRAM), featuring a Silver (Ag) top electrode (TE), with the switching layer comprised of Germanium Sulfide (GeS) and Molybdenum Disulfide (MoS2), while the bottom electrode (BE) utilises Platinum (Pt). The addition of MoS2 layer, which is a semiconducting 2D transition metal dichalcogenide (TMDs), has ion modulation properties which increases reliability of GeS-based CBRAM. The experimental results show bipolar resistive switching at higher compliance current (Icc) and threshold resistive switching at lower Icc. It also achieved Ion/Ioff ratio of 10^7, making it a great candidate for memory devices.