Conductive bridge random access memory

This paper outlines an exploration into the electrical behavior of conductive bridge random-access memory (CBRAM), featuring a Silver (Ag) top electrode (TE), with the switching layer comprised of Germanium Sulfide (GeS) and Molybdenum Disulfide (MoS2), while the bottom electrode (BE) utilises...

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Main Author: Goh, Zu Hong
Other Authors: Ang Diing Shenp
Format: Final Year Project
Language:English
Published: Nanyang Technological University 2024
Subjects:
Online Access:https://hdl.handle.net/10356/176304
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Institution: Nanyang Technological University
Language: English
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spelling sg-ntu-dr.10356-1763042024-05-17T15:45:07Z Conductive bridge random access memory Goh, Zu Hong Ang Diing Shenp School of Electrical and Electronic Engineering EDSAng@ntu.edu.sg Engineering This paper outlines an exploration into the electrical behavior of conductive bridge random-access memory (CBRAM), featuring a Silver (Ag) top electrode (TE), with the switching layer comprised of Germanium Sulfide (GeS) and Molybdenum Disulfide (MoS2), while the bottom electrode (BE) utilises Platinum (Pt). The addition of MoS2 layer, which is a semiconducting 2D transition metal dichalcogenide (TMDs), has ion modulation properties which increases reliability of GeS-based CBRAM. The experimental results show bipolar resistive switching at higher compliance current (Icc) and threshold resistive switching at lower Icc. It also achieved Ion/Ioff ratio of 10^7, making it a great candidate for memory devices. Bachelor's degree 2024-05-15T08:05:29Z 2024-05-15T08:05:29Z 2024 Final Year Project (FYP) Goh, Z. H. (2024). Conductive bridge random access memory. Final Year Project (FYP), Nanyang Technological University, Singapore. https://hdl.handle.net/10356/176304 https://hdl.handle.net/10356/176304 en A2016-231 application/pdf Nanyang Technological University
institution Nanyang Technological University
building NTU Library
continent Asia
country Singapore
Singapore
content_provider NTU Library
collection DR-NTU
language English
topic Engineering
spellingShingle Engineering
Goh, Zu Hong
Conductive bridge random access memory
description This paper outlines an exploration into the electrical behavior of conductive bridge random-access memory (CBRAM), featuring a Silver (Ag) top electrode (TE), with the switching layer comprised of Germanium Sulfide (GeS) and Molybdenum Disulfide (MoS2), while the bottom electrode (BE) utilises Platinum (Pt). The addition of MoS2 layer, which is a semiconducting 2D transition metal dichalcogenide (TMDs), has ion modulation properties which increases reliability of GeS-based CBRAM. The experimental results show bipolar resistive switching at higher compliance current (Icc) and threshold resistive switching at lower Icc. It also achieved Ion/Ioff ratio of 10^7, making it a great candidate for memory devices.
author2 Ang Diing Shenp
author_facet Ang Diing Shenp
Goh, Zu Hong
format Final Year Project
author Goh, Zu Hong
author_sort Goh, Zu Hong
title Conductive bridge random access memory
title_short Conductive bridge random access memory
title_full Conductive bridge random access memory
title_fullStr Conductive bridge random access memory
title_full_unstemmed Conductive bridge random access memory
title_sort conductive bridge random access memory
publisher Nanyang Technological University
publishDate 2024
url https://hdl.handle.net/10356/176304
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