Silicon photonics process simplification - grating mask reduction
In Silicon Photonics, grating couplers are used as a surface-coupling optical component for guiding light in a preferential direction for process control. However, edge couplers can achieve rather high coupling efficiency, broad bandwidth, and polarization independence, which are normally used...
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| Format: | Thesis-Master by Coursework |
| Language: | English |
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Nanyang Technological University
2025
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| Online Access: | https://hdl.handle.net/10356/182802 |
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| Institution: | Nanyang Technological University |
| Language: | English |
| Summary: | In Silicon Photonics, grating couplers are used as a surface-coupling optical
component for guiding light in a preferential direction for process control. However,
edge couplers can achieve rather high coupling efficiency, broad bandwidth, and
polarization independence, which are normally used in real product design. Therefore,
it is critical to develop new grating couplers by reducing grating mask and process,
used for wafer level optical test to get comparable wave guide propagation loss. The
process simplification should not impact product function. In this thesis, new type
grating couplers for both C-band(1550nm) and O-band(1310nm) are designed to
achieve comparable coupling loss with simplified process to existing baseline. Wave
guide propagation loss can be tested comparably to baseline by process control
monitoring structure with new type grating couplers and simplified process. |
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