Fabrication and characterization of low-temperature poly-si TFTs for AMLCD
The objective of this project was to develop a low temperature poly-Si TFT fabrication process based on the existing clean room facilities at Micro-Fabrication Laboratory in NTU. Low temperature poly-Si TFTs were mainly used for active matrix display applications.
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| Format: | Theses and Dissertations |
| Language: | English |
| Published: |
2009
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| Online Access: | http://hdl.handle.net/10356/19343 |
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| Institution: | Nanyang Technological University |
| Language: | English |
| Summary: | The objective of this project was to develop a low temperature poly-Si TFT fabrication process based on the existing clean room facilities at Micro-Fabrication Laboratory in NTU. Low temperature poly-Si TFTs were mainly used for active matrix display applications. |
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