Ferroelectric thin films by RF sputtering technology

A simple hydrogen interface-blocking model is discussed.

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Bibliographic Details
Main Author:	Zhu, Weiguang
Other Authors:	School of Electrical and Electronic Engineering
Format:	Research Report
Published:	2008
Subjects:	DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
Online Access:	http://hdl.handle.net/10356/2733
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Institution:	Nanyang Technological University

id	sg-ntu-dr.10356-2733
record_format	dspace
spelling	sg-ntu-dr.10356-27332023-03-04T03:24:50Z Ferroelectric thin films by RF sputtering technology Zhu, Weiguang School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Microelectronics A simple hydrogen interface-blocking model is discussed. RG 56/96 2008-09-17T09:13:58Z 2008-09-17T09:13:58Z 2000 2000 Research Report http://hdl.handle.net/10356/2733 Nanyang Technological University application/pdf
institution	Nanyang Technological University
building	NTU Library
continent	Asia
country	Singapore Singapore
content_provider	NTU Library
collection	DR-NTU
topic	DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
spellingShingle	DRNTU::Engineering::Electrical and electronic engineering::Microelectronics Zhu, Weiguang Ferroelectric thin films by RF sputtering technology
description	A simple hydrogen interface-blocking model is discussed.
author2	School of Electrical and Electronic Engineering
author_facet	School of Electrical and Electronic Engineering Zhu, Weiguang
format	Research Report
author	Zhu, Weiguang
author_sort	Zhu, Weiguang
title	Ferroelectric thin films by RF sputtering technology
title_short	Ferroelectric thin films by RF sputtering technology
title_full	Ferroelectric thin films by RF sputtering technology
title_fullStr	Ferroelectric thin films by RF sputtering technology
title_full_unstemmed	Ferroelectric thin films by RF sputtering technology
title_sort	ferroelectric thin films by rf sputtering technology
publishDate	2008
url	http://hdl.handle.net/10356/2733
_version_	1759857841673338880

Ferroelectric thin films by RF sputtering technology

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